{"created":"2023-06-20T13:23:10.668403+00:00","id":90,"links":{},"metadata":{"_buckets":{"deposit":"077ef16d-8392-4300-89d5-c6e7cad0031a"},"_deposit":{"created_by":3,"id":"90","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"90"},"status":"published"},"_oai":{"id":"oai:kougei.repo.nii.ac.jp:00000090","sets":["12:17:30:31"]},"author_link":["205","198","196","200","199","197","202","204","206","203","201","207"],"item_2_biblio_info_12":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1984","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1","bibliographicPageEnd":"87","bibliographicPageStart":"78","bibliographicVolumeNumber":"7","bibliographic_titles":[{"bibliographic_title":"東京工芸大学工学部紀要"},{"bibliographic_title":"The Academic Reports, the Faculty of Engineering, Tokyo Polytechnic University","bibliographic_titleLang":"en"}]}]},"item_2_description_11":{"attribute_name":"抄録(英)","attribute_value_mlt":[{"subitem_description":"Microwave plasma of SiH_4/H_2 gas has been produced by glow discharge in direction of microwave propagation along a ridge waveguide and investigated by observing distribution of optical emission from the plasma. 0ptimum position of gas inlet has been obtained. Deposited film posseses more or less microcrystalline phase, but its photoelectric property differs whether it is prepared inside or outside the plasma. Photoelectric property of the film obtained inside the plasma is poor but it is improved by hydrogenation or intermittent discharge. The film obtained outside the plasma has fairly good photoelectric property and growth rate of 20Å/s. It is postulated that the former film is affected by high substrate temperature and the latter is grown partly by chemical transport.","subitem_description_type":"Other"}]},"item_2_description_15":{"attribute_name":"表示順","attribute_value_mlt":[{"subitem_description":"12","subitem_description_type":"Other"}]},"item_2_description_16":{"attribute_name":"アクセション番号","attribute_value_mlt":[{"subitem_description":"KJ00002409584","subitem_description_type":"Other"}]},"item_2_description_8":{"attribute_name":"記事種別(日)","attribute_value_mlt":[{"subitem_description":"論文","subitem_description_type":"Other"}]},"item_2_description_9":{"attribute_name":"記事種別(英)","attribute_value_mlt":[{"subitem_description":"Article","subitem_description_type":"Other"}]},"item_2_source_id_1":{"attribute_name":"雑誌書誌ID","attribute_value_mlt":[{"subitem_source_identifier":"AN00159741","subitem_source_identifier_type":"NCID"}]},"item_2_source_id_19":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"03876055","subitem_source_identifier_type":"ISSN"}]},"item_2_text_6":{"attribute_name":"著者所属(日)","attribute_value_mlt":[{"subitem_text_value":"東京工芸大学工学部電子工学科"},{"subitem_text_value":"東京工芸大学工学部電子工学科"},{"subitem_text_value":"(現)富士ゼロックス株式会社"},{"subitem_text_value":"(現)シャープ株式会社"},{"subitem_text_value":"東京工芸大学工学部電子工学科"},{"subitem_text_value":"東京工芸大学工学部電子工学科"}]},"item_2_text_7":{"attribute_name":"著者所属(英)","attribute_value_mlt":[{"subitem_text_language":"en","subitem_text_value":"/"},{"subitem_text_language":"en","subitem_text_value":"FUJI XEROX"},{"subitem_text_language":"en","subitem_text_value":"SHARP"},{"subitem_text_language":"en","subitem_text_value":"/"}]},"item_2_title_3":{"attribute_name":"論文名よみ","attribute_value_mlt":[{"subitem_title":"マイクロハ グローホウデン CVD ニ ヨル a-Si:Hハクマク ノ セイセイ"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"加藤, 静一"},{"creatorName":"カトウ, セイイチ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{"nameIdentifier":"196","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"青木, 彪"},{"creatorName":"アオキ, タケシ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{"nameIdentifier":"197","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"安田, 佳之"},{"creatorName":"ヤスダ, 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