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タイコウターゲットシキ スパッタホウ ニヨリ エラレル ハクマク ノ ビサイコウゾウ ノ ケイサンキ シミュレーション 対向ターゲット式スパッタ法により得られる薄膜の微細構造の計算機シミュレーション COMPUTER SIMULATION OF THIN FILM MICROSTRUCTURE DEPOSITED BY FACING TARGET SPUTTRING 神戸, 明宏 748 カンベ, アキヒロ 星, 陽一 749 ホシ, ヨウイチ 鈴木, 英佐 750 スズキ, エイスケ KANBE, Akihiro 751 HOSHI, Yoichi 752 SUZUKI, Eisuke 753 In order to clarify the changes in film structure in relation to the sputtering conditions in a facing target sputtering system, we carried out three dimensional computer simulation based on Monte Carlo method. This simulation model includes Motohiro's model and Turner's model. First, distribution of the incidence angles of depositing particles to the substrate plane and deposition rate of the film were calculated for various sputtering gas pressure. The calculated distribution of the incidence angles and deposition rate were cioncident well with experimental results. Then, according to the calculated angular distribution, atoms assumed to be hard spheres were deposited on substrate by using Henderson's model. This simulation showed that film density decreases and film roughness increases as the sputtering gas pressure increases since the self shadowing effect becomes more prominent at a higher gas pressure. When surface migration of the deposited atoms due to thermal stimulation through lattice vibration was took into the simulation, the surface migration causes a significant increase in film density and leads to a decrease in film roughness. 15 KJ00001512055 論文 Article departmental bulletin paper 1996 application/pdf 東京工芸大学工学部紀要 1 19 72 77 The Academic Reports, the Faculty of Engineering, Tokyo Polytechnic University AN00159741 03876055 https://kougei.repo.nii.ac.jp/record/280/files/KJ00001512055.pdf https://kougei.repo.nii.ac.jp/records/280 jpn