2026-03-10T22:10:23Z https://kougei.repo.nii.ac.jp/oai

oai:kougei.repo.nii.ac.jp:00002119 2023-06-20T13:36:17Z 12:17:284:285

軸外物点を考慮した極紫外多層膜対物ミラーの光学設計 Optical Design Method for Wide-Field Imaging Objective Made of Reflective Multilayer Mirrors for Extreme Ultraviolet Microscopy 相澤, 駿介 アイザワ, シュンスケ 脇, 俊太郎 ワキ, シュンタロウ 豊田, 光紀 トヨダ, ミツノリ Aizawa, Shunsuke Waki, Syuntaro Toyoda, Mitsunori 多層膜ミラー 極紫外線 軟X線 Multilayer mirror extreme ultraviolet soft X-ray The optical design of multilayer mirrors for imaging applications in extreme ultraviolet region is discussed. Firstly, the conditions of the Bragg reflection required for a multilayer coating, in the case of imaging an on-axis object with a concave mirror, is derived by introducing paraxial approximation. The validity of the approximation is evaluated by numerical calculations with ray tracing method, where the approximation does not hold in a wide-field optical system such as a microscopic objective or projection optics for a lithography exposure in EUV region. Next, we propose a novel design method applicable to wide-field optical system. The proposed method is demonstrated with a three-mirror microscope objective, and we show that, practical high reflectivity can be obtained over the entire surface of the mirror. We also discuss an effect of wave aberrations arising from multi-beam interference on the multilayer mirrors 東京工芸大学工学部 2021-06-30 jpn departmental bulletin paper https://kougei.repo.nii.ac.jp/records/2119 03876055 東京工芸大学工学部紀要 The Academic Reports, the Faculty of Engineering, Tokyo Polytechnic University 44 1 1 5 https://kougei.repo.nii.ac.jp/record/2119/files/vol44-1-01.pdf application/pdf 2.2 MB 2021-06-30