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対向ターゲット式スパッタ法により得られる薄膜の微細構造の計算機シミュレーション COMPUTER SIMULATION OF THIN FILM MICROSTRUCTURE DEPOSITED BY FACING TARGET SPUTTRING タイコウターゲットシキ スパッタホウ ニヨリ エラレル ハクマク ノ ビサイコウゾウ ノ ケイサンキ シミュレーション 神戸, 明宏 カンベ, アキヒロ 星, 陽一 ホシ, ヨウイチ 鈴木, 英佐 スズキ, エイスケ KANBE, Akihiro HOSHI, Yoichi SUZUKI, Eisuke In order to clarify the changes in film structure in relation to the sputtering conditions in a facing target sputtering system, we carried out three dimensional computer simulation based on Monte Carlo method. This simulation model includes Motohiro's model and Turner's model. First, distribution of the incidence angles of depositing particles to the substrate plane and deposition rate of the film were calculated for various sputtering gas pressure. The calculated distribution of the incidence angles and deposition rate were cioncident well with experimental results. Then, according to the calculated angular distribution, atoms assumed to be hard spheres were deposited on substrate by using Henderson's model. This simulation showed that film density decreases and film roughness increases as the sputtering gas pressure increases since the self shadowing effect becomes more prominent at a higher gas pressure. When surface migration of the deposited atoms due to thermal stimulation through lattice vibration was took into the simulation, the surface migration causes a significant increase in film density and leads to a decrease in film roughness. 15 KJ00001512055 論文 Article 1996 jpn departmental bulletin paper https://kougei.repo.nii.ac.jp/records/280 AN00159741 03876055 東京工芸大学工学部紀要 The Academic Reports, the Faculty of Engineering, Tokyo Polytechnic University 19 1 72 77 https://kougei.repo.nii.ac.jp/record/280/files/KJ00001512055.pdf application/pdf 539.7 kB 2017-04-21